Polishing liquid composition for magnetic-disk substrate

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United States of America Patent

PATENT NO 9070399
APP PUB NO 20110240594A1
SERIAL NO

13133736

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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There is provided a polishing composition for a magnetic disk substrate that can reduce scratches, nanoprotrusion defects, and substrate surface waviness after polishing. The polishing composition for a magnetic disk substrate that contains: a copolymer that has a constituent unit derived from a monomer having a solubility of 2 g or less in 100 g of water at 20° C. and a constituent unit having a sulfonic acid group, and has a saturated hydrocarbon chain as the main chain thereof, or a salt of the copolymer; an abrasive; and water.

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Patent Owner(s)

  • KAO CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Doi, Haruhiko Wakayama, JP 12 66
Hamaguchi, Takeshi Wakayama, JP 17 88

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