Reflective mask blank, reflective mask and method of manufacturing reflective mask

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United States of America Patent

PATENT NO 9075315
SERIAL NO

13628790

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Abstract

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The present invention is a reflective mask blank used to fabricate a reflective mask, which has a laminated structure of a multilayer reflective film, an absorber film and an etching mask film in this order on a substrate, wherein the etching mask film comprises a material containing chromium, the absorber film comprises a material containing tantalum, a highly oxidized layer is formed on the surface layer of the absorber film on the opposite side from the substrate, and a Ta 4f narrow spectrum of the highly oxidized layer when analyzed by X-ray photoelectron spectroscopy has a maximum peak at a binding energy of more than 23 eV.

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Patent Owner(s)

  • HOYA CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nozawa, Osamu Shinjuku-ku, JP 125 896
Ohkubo, Ryo Shinjuku-ku, JP 34 125
Sakai, Kazuya Shinjuku-ku, JP 39 195
Suzuki, Toshiyuki Shinjuku-ku, JP 316 3892

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