Method and apparatus for angular high density plasma chemical vapor deposition

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United States of America Patent

PATENT NO 9080239
APP PUB NO 20120190203A1
SERIAL NO

13434934

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Abstract

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Forming a shallow trench capacitor in conjunction with an FET by forming a plurality of STI trenches; for the FET, implanting a first cell well having a first polarity between a first and a second of the STI trenches; for the capacitor, implanting a second cell well having a second polarity in an area of a third of the STI trenches; removing dielectric material from the third STI trench; forming a gate stack having a first portion located between the first and the second of the STI trenches and a second portion located over and extending into the third trench; and performing a source/drain implant of the same polarity as the second cell well, thereby forming a FET in the first cell well, and a capacitor in the second cell well. The second polarity may be opposite from the first polarity. An additional implant may reduce ESR in the second cell well.

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Patent Owner(s)

  • GLOBALFOUNDRIES INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cheng, Kangguo Hopewell Junction, US 3073 29791
Smetana, Pavel Hopewell Junction, US 15 158
Wise, Richard S Hopewell Junction, US 71 758
Wong, Keith Kwong Hon Hopewell Junction, US 241 2682
Yang, Daewon Hopewell Junction, US 31 188

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