Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition

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United States of America Patent

PATENT NO 9081279
APP PUB NO 20140134541A1
SERIAL NO

14158490

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Abstract

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A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent; and a pattern forming method using the positive resist composition.

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Patent Owner(s)

  • FUJIFILM CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kanda, Hiromi Shizuoka, JP 50 883
Kanna, Shinichi Shizuoka, JP 102 1310

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