Methods and apparatuses for forming semiconductor films

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United States of America Patent

PATENT NO 9082619
APP PUB NO 20140011342A1
SERIAL NO

13544562

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Abstract

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Described herein are systems and methods method for forming semiconductor films. In some embodiment, the methods comprising depositing the source solution containing a solvent and plurality of types of metal ionic species and a second type on a substrate heated to a temperature at or above the boiling point of the solvent. In some embodiments, methods and apparatus for exposing a substrate to a gas are also provided.

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Patent Owner(s)

Patent OwnerAddress
INTERNATIONAL SOLAR ELECTRIC TECHNOLOGY INC20600 PLUMMER ST CHATSWORTH CA 91311

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bansal, Ashish Porter Ranch, US 76 294
Guevarra, Dan Norwalk, US 1 5
Haber, Joel Pasadena, US 1 5
Kapur, Vijay K Tarzana, US 12 823
Kapur, Vincent Tarzana, US 1 5

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