Method and apparatus for processing wafer-shaped articles

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9090854
APP PUB NO 20130098392A1
SERIAL NO

13281014

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Abstract

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In a method and apparatus for treating a surface of an article, an improved rinse liquid prevents build-up of static charge while avoiding damages to certain types of exposed metal-containing surfaces. In one embodiment, a semiconductor wafer having structures including at least one of cobalt, nickel and platinum is rotated on a spin chuck, as a rinse liquid is dispensed onto a surface of the wafer. The rinse liquid is a dilute aqueous solution of a base of the formula

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Patent Owner(s)

Patent OwnerAddress
LAM RESEARCH AGSEZ-STRASSE 1 9500 VILLACH 9500

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hoffmann, Stephan Finkenstein, DE 13 40
Kraus, Harald Villach, AT 49 177
Mettin, Gunter Villach, AT 2 4

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