Target supply apparatus and target supply method
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United States of America Patent
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Aug 4, 2015
Grant Date -
Aug 15, 2013
app pub date -
Jan 29, 2013
filing date -
Feb 10, 2012
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A target supply apparatus used in an extreme ultraviolet light apparatus that generates extreme ultraviolet light by irradiating a target with a laser beam may include a tank, a nozzle that includes a through-hole and is disposed so that the through-hole communicates with the interior of the tank, a first heater disposed along a wall of the tank, a second heater disposed along a wall of the tank in a position that is further from the nozzle than the first heater, and a control unit configured to control the first heater and the second heater so that a temperature of the first heater is greater than a temperature of the second heater.
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