Substrates and methods of forming a pattern on a substrate

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United States of America Patent

PATENT NO 9102121
APP PUB NO 20130295335A1
SERIAL NO

13463468

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Substrates and methods of forming a pattern on a substrate. The pattern includes a repeating pattern region and a pattern-interrupting region adjacent to the repeating pattern region. A mask is formed on the substrate, with the mask including the repeating pattern region and the pattern-interrupting region and which are formed using two separate masking steps. The mask is used in forming the pattern into underlying substrate material on which the mask is received. Substrates comprising masks are also disclosed.

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Patent Owner(s)

  • MICRON TECHNOLOGY, INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Armstrong, Kyle Meridian, US 8 32
Hyatt, Michael D Boise, US 10 16
Kewley, David A Boise, US 34 137
Sipani, Vishal Boise, US 25 68
Van, Patten Michael Dean Fruitland, US 5 6

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