Substrate processing apparatus and method of operating the same

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United States of America Patent

PATENT NO 9108296
APP PUB NO 20120282845A1
SERIAL NO

13137555

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Abstract

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Provided is a substrate processing apparatus including a first conduit configured to supply a processing solution to a substrate loaded on a supporter, and a second conduit in fluid communication with the first conduit, the second conduit configured to supply a gas to the first conduit to be mixed with the processing solution, wherein the first conduit includes an opening to permit the processing solution mixed with the gas to be injected onto the substrate.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG DISPLAY CO LTDGYEONGGI-DO

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Sung Gyu Yongin, KR 25 150
Whang, Jong Kwang Yongin, KR 1 17

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