Method for fabricating an amplification gap of an avalanche particle detector
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United States of America Patent
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Aug 18, 2015
Grant Date -
Oct 18, 2012
app pub date -
Sep 17, 2010
filing date -
Oct 28, 2009
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Abstract
The invention relates to an improved method for fabricating the amplification gap of an avalanche particle detector in which two parallel electrodes are spaced apart by dielectric spacer elements. A foil including a bulk layer made of dielectric material sandwiched by two mutually parallel metallic electrodes is provided, and holes are formed in one of the metallic layers by means of photolithography. The amplification gap is then formed in the bulk layer by means of carefully controlled etching of the bulk material through the holes formed in one of the metallic layers. The invention not only provides a simplified fabrication process, but also results in a detector with enhanced spatial and energy resolution.
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