Electron beam exposure method
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United States of America Patent
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Aug 25, 2015
Grant Date -
May 1, 2014
app pub date -
Oct 17, 2013
filing date -
Oct 25, 2012
priority date (Note) -
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Abstract
An electron beam exposure method includes the steps of: preparing an exposure mask having a plurality of opening patterns formed by dividing a drawing object pattern into exposable regions; and drawing the drawing object pattern by performing exposure with an electron beam passing through the opening patterns of the exposure mask. Each end portion serving as a joint in each opening pattern of the exposure mask is provided with a joining portion tapered in a width of the opening pattern. The exposure is performed in such a way that portions drawn through adjacent joining portions overlap each other.
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