Reflection shadow mask alignment using coded apertures
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United States of America Patent
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-
Sep 1, 2015
Grant Date -
Dec 26, 2013
app pub date -
Aug 22, 2013
filing date -
Jun 4, 2010
priority date (Note) -
In Force
status (Latency Note)
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Abstract
In a shadow mask-substrate alignment method, a light source, a beam splitter, a first substrate including a first grate, a second substrate including a second grate, and a light receiver are positioned relative to each other to define a light path that includes light output by the light source being reflected a first time by the beam splitter. The light reflected the first time passes through the first or second grate and is at least partially reflected a second time by the second or first grate back through the first or the second grate, respectively. The light reflected the second time passes at least partially through the beam splitter for receipt by the light receiver. The orientation of the first substrate, the second substrate or both is adjusted to position the first grate, the second grate, or both until a predetermined amount is received by the light receiver.
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Cited Art Landscape
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