Dual-purpose facility of continuous hot-dip coating and continuous annealing
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United States of America Patent
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Sep 8, 2015
Grant Date -
Apr 3, 2014
app pub date -
Dec 5, 2013
filing date -
Oct 1, 2009
priority date (Note) -
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Abstract
A dual-purpose facility of continuous hot-dip coating and continuous annealing is configured so as to be switched between a continuous hot-dip coated material production line and a continuous annealed material production line, and includes a gas discharge path that discharges atmosphere gas in an annealing furnace from a gas discharge port provided in an outlet side of the annealing furnace out of the annealing furnace and a path opening and closing unit for opening and closing the gas discharge path. The path opening and closing unit opens the gas discharge path when the dual-purpose facility is used as the continuous hot-dip coated material production line and closes the gas discharge path when the dual-purpose facility is used as the continuous annealed material production line.
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