Sputtering target material

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United States of America Patent

PATENT NO 9127346
APP PUB NO 20120070332A1
SERIAL NO

13305963

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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This invention provides sputtering target materials having high reflectance and excellent heat resistance, which are formed of Ag base alloys formed by adding a specific, minor amount of P to Ag and alloying them.

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Patent Owner(s)

Patent OwnerAddress
ISHIFUKU METAL INDUSTRY CO LTDCHIYODA-KU TOKYO 101-0047

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hasegawa, Koichi Soka, JP 131 1005
Ishii, Nobuo Soka, JP 83 3487

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