Pattern formation method

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United States of America Patent

PATENT NO 9134605
APP PUB NO 20130236658A1
SERIAL NO

13590583

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Abstract

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According to one embodiment, a pattern formation method includes: forming a cyclic pattern having first strips of a first polymer component and second strips of a second polymer component by forming chemical guides having affinity for the first polymer component on a substrate to be processed and coating a directed self-assembly material comprising the first polymer component and the second polymer component on the substrate to be processed. In this pattern formation method, the chemical guides comprise a plurality of regions arrayed in matrix with a predetermined interval on the substrate to be processed; each of the regions has a symmetrical shape with respect to a centerline of the region, the centerline extends in the first direction; and a width along the first direction of the region is narrowed from the centerline toward each of end parts of the region.

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Patent Owner(s)

  • TOSHIBA MEMORY CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sato, Hironobu Sagamihara, JP 29 371

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