Apparatus and method for treating substrate

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United States of America Patent

PATENT NO 9136147
APP PUB NO 20130029282A1
SERIAL NO

13559838

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Abstract

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Provided are an apparatus and method for treating a substrate. More particularly, an apparatus and method for treating a substrate through a supercritical process are provided. The apparatus includes: a housing having an entrance in a predetermined surface thereof and providing a space for performing a high pressure process; a support member disposed in the housing to support a substrate; a door for opening and closing the entrance; and a pressing member configured to apply a force to the door so as to close the housing during the high pressure process.

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Patent Owner(s)

Patent OwnerAddress
SEMES CO LTD77 4SANDAN 5-GIL JIKSAN-EUP SEOBUK-GU CHEONAN-SI CHUNGCHEONGNAM-DO 31040

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jang, Sungho Cheonan-si, KR 49 107
Kim, Boong Cheonan-si, KR 18 126
Kwon, Oh Jin Cheonan-si, KR 31 138
Park, Joo Jib Asan-si, KR 18 98

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