Alignment mark, photomask, and method for forming alignment mark
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 15, 2015
Grant Date -
Jan 8, 2015
app pub date -
Jan 10, 2014
filing date -
Jul 8, 2013
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
According to one embodiment, an alignment mark provided on an underlayer includes a plurality of first guide pattern features, and a first self-assembled film. The first guide pattern features extend in a first direction and are aligned in a second direction crossing the first direction. The first self-assembled film is provided between adjacent ones of the first guide pattern features and includes a plurality of first line pattern features and a second line pattern feature. The first line pattern features extends in the first direction, is aligned in the second direction, and has a pitch in the second direction narrower than a pitch in the second direction of the first guide pattern features. The second line pattern feature is provided between adjacent ones of the first line pattern features and extends in the first direction.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully