Illumination optical system, exposure apparatus, and device manufacturing method
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United States of America Patent
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Sep 22, 2015
Grant Date -
Oct 10, 2013
app pub date -
Mar 15, 2013
filing date -
Apr 5, 2012
priority date (Note) -
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status (Latency Note)
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Abstract
An illumination optical system includes: a stop configured to define an illumination range of a surface to be illuminated; an imaging optical system configured to form an image of an aperture of the stop onto the surface to be illuminated; an calculation unit configured to calculate an offset amount between a size of the aperture and a target illumination range of the surface to be illuminated using data on the target illumination range; and an adjusting unit configured to adjust the size of the aperture based on the calculated offset amount. The offset amount differs according to a size of the target illumination range.
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