Monolithic aluminum alloy target and method of manufacturing

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United States of America Patent

PATENT NO 9150956
APP PUB NO 20130306467A1
SERIAL NO

13951991

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Abstract

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Aluminum or aluminum alloy sputter targets and methods of making same are provided. The pure aluminum or aluminum alloy is mechanically worked to produce a circular blank, and then the blank is given a recrystallization anneal to achieve desirable grain size and crystallographic texture. A 10-50% additional strain is provided to the blank step after the annealing to increase the mechanical strength. Further, in a flange area of the target, the strain is greater than in the other target areas with the strain in the flange area being imparted at a rate of about 20-60% strain. The blank is then finished to form a sputtering target with desirable crystallographic texture and adequate mechanical strength.

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Patent Owner(s)

  • TOSOH SMD, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bailey, Robert S Grove City, US 17 118
Miao, Weifang Columbus, US 10 19
Smathers, David B Columbus, US 41 220

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