Shadow mask alignment using coded apertures

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9157148
APP PUB NO 20130236287A1
SERIAL NO

13695488

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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In a shadow mask-substrate alignment method, a substrate is provided that includes a grate having a plurality of spaced bars and a shadow mask is provided that includes a grate having a plurality of spaced bars. Also provided is a light source-light receiver pair that defines a path of light therebetween. The grate of the substrate and the grate of the shadow mask are caused to be positioned in the path of the light. Thereafter, the orientation of the substrate, the shadow mask, or both are caused to be adjusted to position the grate of the substrate, the grate of the shadow mask, or both until a predetermined amount of light or a predetermined range of an amount of light on the path passing through the grates is received by the light receiver.

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Patent Owner(s)

Patent OwnerAddress
AGL OLED LIMITEDFLAT/RM AI 3/F MIRADOR MANSION 54-64 NATHAN ROAD TSIM SHA TSUI KL HONG KONG

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Tamura, Nobuhiko Murrysville, US 25 662

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