Methods for releasing graphene from a metal substrate by electrowetting

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United States of America Patent

PATENT NO 9169575
SERIAL NO

14195802

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Abstract

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It is often desirable to release graphene from its growth substrate. Present graphene release techniques can damage the graphene and produce significant quantities of hazardous waste. Electrowetting techniques can be used in alternative approaches for releasing graphene from its growth substrate. Methods for releasing graphene by electrowetting can include providing a metal substrate having graphene adhered thereto, applying a dielectric layer to the graphene to form a coated structure, placing the coated structure in a liquid medium, establishing an electrical potential between the metal substrate and a conductor disposed proximate to at least a portion of the dielectric layer such that the electrical potential induces infiltration of the liquid medium between at least a portion of the metal substrate and the graphene, and releasing the graphene from the metal substrate in the presence of the infiltrated liquid medium. The electrical potential can be maintained until the graphene is released.

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Patent Owner(s)

Patent OwnerAddress
LOCKHEED MARTIN CORPORATION6801 ROCKLEDGE DRIVE BETHSEDA MD 20817

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bedworth, Peter V Los Gatos, US 41 1187
Swett, Jacob Louis Mountain View, US 11 249

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