Lithographic apparatus and device manufacturing method using dose control
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United States of America Patent
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Nov 3, 2015
Grant Date -
Jun 26, 2014
app pub date -
Feb 26, 2014
filing date -
Jun 8, 2004
priority date (Note) -
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Abstract
A system and method are used to manufacture a device using at least one exposure step. Each exposure step projects a patterned beam of radiation onto a substrate. The patterned beam includes a plurality of pixels. Each pixel delivers a radiation dose no greater than a predetermined normal maximum dose to the target portion in the exposure step and/or at least one selected pixel delivers an increased radiation dose, greater than the normal maximum dose. The increased dose may be delivered to compensate for the effect of a defective element at a known position in the array on a pixel adjacent a selected pixel or compensate for underexposure of the target portion at the location of a selected pixel resulting from exposure of that location to a pixel affected by a known defective element in another exposure step.
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