Charged particle beam apparatus
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United States of America Patent
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Nov 17, 2015
Grant Date -
Oct 2, 2014
app pub date -
Mar 20, 2014
filing date -
Mar 25, 2013
priority date (Note) -
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Abstract
The present invention provides apparatuses to inspect small particles on the surface of a sample such as wafer and mask. The apparatuses provide both high detection efficiency and high throughput by forming Dark-field BSE images. The apparatuses can additionally inspect physical and electrical defects on the sample surface by form SE images and Bright-field BSE images simultaneously. The apparatuses can be designed to do single-beam or even multiple single-beam inspection for achieving a high throughput.
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