Liquid arm cleaning unit for substrate processing apparatus

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United States of America Patent

PATENT NO 9190311
APP PUB NO 20120180828A1
SERIAL NO

13351653

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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Disclosed are a liquid processing apparatus and a liquid processing method that can prevent a substrate in a processing chamber from being contaminated due to contamination attached to a nozzle supporting arm that supports a nozzle. The liquid processing apparatus of the present disclosure includes: a processing chamber having a substrate holding unit configured to hold a substrate and a cup disposed around the substrate holding unit; a nozzle configured to supply a fluid to the substrate held by the substrate holding unit; and a nozzle supporting arm configured to support the nozzle. An arm cleaning unit configured to clean the nozzle supporting arm is installed in the liquid processing apparatus.

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Patent Owner(s)

  • TOKYO ELECTRON LIMITED

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Aiura, Kazuhiro Koshi, JP 19 71
Hachiya, Yosuke Koshi, JP 21 83
Higashijima, Jiro Koshi, JP 43 180
Ito, Yuki Koshi, JP 236 965
Itoh, Norihiro Koshi, JP 15 63
Shindo, Naoki Koshi, JP 57 468

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