Micro-column with double aligner

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United States of America Patent

PATENT NO 9196454
APP PUB NO 20140239190A1
SERIAL NO

14184931

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Abstract

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Disclosed herein is a microcolumn with a double aligner. The microcolumn is configured such that when an axis of an aperture of a limiting aperture is spaced apart from an original path of a particle beam, the path of the particle beam can be effectively compensated for in such a way that the path of the particle beam is aligned with the axis of the aperture of the limiting aperture by the double aligner. The microcolumn includes a source lens. The source lens includes at least two aligner layers which compensate for the path of the particle beam.

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Patent Owner(s)

Patent OwnerAddress
INDUSTRY-UNIVERSITY COOPERATION FOUNDATION SUNMOON UNIVERSITYKALSAN-RI TANGJEONG-MYEON ASAN CITY CHUNGCHEONGNAM-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ahn, Seung Joon Daejeon, KR 5 15
Kim, Dae Wook Gyeonggi-do, KR 41 198
Kim, Ho Seob Incheon, KR 29 96
Oh, Tae Sik Chungcheongnam-do, KR 19 9

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