Inhibiting background plating

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United States of America Patent

PATENT NO 9206520
APP PUB NO 20100029077A1
SERIAL NO

12462325

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Abstract

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Methods include selectively depositing a phase change resist having high light transmittance onto a dielectric to form a pattern, etching away portions of the dielectric not covered by the resist and depositing a metal seed layer on the etched portions of the dielectric. A metal layer is then deposited on the metal seed layer by light induced plating.

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Patent Owner(s)

  • SUN CHEMICAL CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Barr, Robert K Shrewsbury, US 73 393
Dong, Hua Shrewsbury, US 82 602
Sutter, Thomas C Holden, US 5 67

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