Substrate cleaning apparatus and vacuum processing system
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United States of America Patent
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Dec 15, 2015
Grant Date -
Oct 4, 2012
app pub date -
Mar 26, 2012
filing date -
Mar 31, 2011
priority date (Note) -
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Abstract
A substrate cleaning apparatus includes a supporting unit, provided in a processing chamber having a gas exhaust port, for supporting a substrate; one or more nozzle units, each for ejecting gas clusters to a peripheral portion of the substrate supported by the supporting unit to remove unnecessary substances from the peripheral portion; and a moving mechanism for changing relative positions of the supporting unit and the nozzle unit during ejecting the gas clusters. Each nozzle unit discharges a cleaning gas having a pressure higher than that in the processing chamber so that the cleaning gas is adiabatically expanded to form aggregates of atoms and/or molecules.
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