Apparatus for irradiating a substrate
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United States of America Patent
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Feb 2, 2016
Grant Date -
Feb 19, 2015
app pub date -
Jan 18, 2013
filing date -
Mar 26, 2012
priority date (Note) -
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Abstract
Known apparatuses for irradiating a substrate include a receptacle for the substrate to be irradiated having a circular irradiation surface and a first optical emitter having at least one emitter tube arranged in an illumination plane extending parallel to the irradiation surface. The illumination length of the emitter tube includes a middle section and two end sections, the length of the middle section accounting for at least 50% of the illumination length. The receptacle and the optical emitter are movable relative to each other. An apparatus for thermal treatment of a substrate, enabling ho-mogeneous and/or rotationally symmetrical heating of the substrate and requiring less complexity in its design and control technology, includes a middle section of the emitter tube having a steadily decreasing curvature, provided that the illumination length of the emitter tube extends over an angle of curvature of less than 2π.
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