Photoresist compositions and methods of use in high index immersion lithography
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United States of America Patent
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Feb 2, 2016
Grant Date -
Nov 15, 2012
app pub date -
Jul 8, 2012
filing date -
Jan 16, 2008
priority date (Note) -
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Abstract
The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopropanol and preferably a second monomer selected from fluorinated styrene and fluorinated vinyl ether. The invention composition has improved receding contact angles with high refractive index hydrocarbon fluids used in immersion lithography and, thereby, provides improved performance in immersion lithography.
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