Mask plate and a method for producing a substrate mark
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United States of America Patent
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-
Feb 9, 2016
Grant Date -
Nov 19, 2015
app pub date -
Sep 30, 2014
filing date -
May 14, 2014
priority date (Note) -
In Force
status (Latency Note)
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Abstract
The general inventive concepts relate to the field of display technology, and provide a mask plate and a method for producing a substrate mark to increase the accuracy of the production of a substrate mark, and decrease the difficulty in monitoring products and the production cost. An exemplary mask plate comprises: a display region mask part; at least one pair of test mark mask parts, a test mark mask part being located on either side of the display region mask part and their positions being opposite to each other; and a protection mark mask part correspondingly disposed on the outside of each test mark mask part relative to the display region mask part, wherein the pattern outline of the protection mark mask part is larger than that of the test mark mask part.
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