Methanofullerenes

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United States of America Patent

PATENT NO 9256126
APP PUB NO 20140134843A1
SERIAL NO

14068254

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Abstract

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The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

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Patent Owner(s)

  • IRRESISTIBLE MATERIALS LTD

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Athens, Drew Dover, US 1 1
Frommhold, Andreas Anger, DE 14 32
McClelland, Alexandra Worcester, GB 5 10
Palmer, Richard Edward Southbridge, GB 8 45
Preece, Jon Andrew Birmningham, GB 6 30
Robinson, Alex Philip Graham Birmingham, GB 7 10
Xu, Xiang Winchester, US 167 891
Yang, Dongxu Birmingham, GB 10 22

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