Substrate treatment method and substrate treatment apparatus
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United States of America Patent
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Feb 16, 2016
Grant Date -
Mar 6, 2014
app pub date -
Aug 27, 2013
filing date -
Aug 28, 2012
priority date (Note) -
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status (Latency Note)
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Abstract
A substrate treatment method is provided, which includes: a liquid film forming step of forming a liquid film of a treatment liquid on a front surface of a substrate; a hydrophobization liquid supplying step of supplying a hydrophobization liquid to a center portion of the front surface of the substrate for hydrophobizing the front surface of the substrate, while rotating the substrate; an inactivation suppressing step of suppressing inactivation of the supplied hydrophobization liquid on a peripheral edge portion of the front surface of the substrate simultaneously with the hydrophobization liquid supplying step; and a drying step of drying the substrate to which the hydrophobization liquid has been supplied.
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