CMP method for forming smooth diamond surfaces

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United States of America Patent

PATENT NO 9259819
APP PUB NO 20150027981A1
SERIAL NO

14494276

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Abstract

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A method of chemical mechanical polishing (CMP) a diamond containing surface includes providing a slurry including a plurality of particles, at least one oxidizer, and at least one acid, wherein the slurry has a pH≦3 or pH greater than 11. At least an outer surface of the plurality of particles is softer than the diamond surface or the particles are diamond particles averaging less than (<) 2 μm in size. The diamond surface is pressed with respect to a polishing pad providing a Shore D Hardness less than 99 having the slurry in between while rotating the polishing pad relative to the diamond surface to form a smooth diamond surface having a root mean square (rms) surface roughness less than 15 nm.

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Patent Owner(s)

Patent OwnerAddress
ENTEGRIS INC129 CONCORD ROAD BILLERICA MA 01821

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Arjunan, Arul Chakkaravarthi Gainesville, US 12 89
Singh, Deepika Newberry, US 27 254
Singh, Rajiv K Newberry, US 44 794

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