Film-forming apparatus and film-forming method

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United States of America Patent

PATENT NO 9273412
APP PUB NO 20120325138A1
SERIAL NO

13527198

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Abstract

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A film-forming apparatus and method comprising a film-forming chamber for supplying a reaction gas into, a cylindrical shaped liner provided between an inner wall of the film-forming chamber and a space for performing a film-forming process, a main-heater for heating a substrate placed inside the liner, from the bottom side, a sub-heater cluster provided between the liner and the inner wall, for heating the substrate from the top side, wherein the main-heater and the sub-heater cluster are resistive heaters, wherein the sub-heater cluster has a first sub-heater provided at the closest position to the substrate, and a second sub-heater provided above the first sub-heater, wherein the first sub-heater heats the substrate in combination with the main-heater, the second sub-heater heats the liner at a lower output than the first sub-heater, wherein each temperature of the main-heater, the first sub-heater, and the second sub-heater is individually controlled.

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Patent Owner(s)

  • CENTRAL RESEARCH INSTITUTE OF ELECTRIC POWER INDUSTRY;DENSO CORPORATION;NUFLARE TECHNOLOGY, INC.;TOYOTA JIDOSHA KABUSHIKI KAISHA

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Adachi, Ayumu Aichi, JP 14 121
Fujibayashi, Hiroaki Kanagawa, JP 22 59
Ikeya, Naohisa Kanagawa, JP 7 16
Ito, Hideki Kanagawa, JP 233 1863
Ito, Masahiko Kanagawa, JP 139 1953
Kamata, Isaho Tokyo, JP 36 242
Naito, Masami Aichi, JP 23 507
Nishikawa, Koichi Aichi, JP 22 191
Suzuki, Kunihiko Shizuoka, JP 272 4645
Tsuchida, Hidekazu Kanagawa, JP 56 391

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