Single-chamber apparatus for precision cleaning and drying of flat objects
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United States of America Patent
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Mar 1, 2016
Grant Date -
Feb 5, 2009
app pub date -
Jul 30, 2007
filing date -
Jul 30, 2007
priority date (Note) -
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status (Latency Note)
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Abstract
A single-chamber type cleaning-drying apparatus for flat objects, such as semiconductor wafers, wherein cleaning is carried out by impinging both sides of the wafer, which rotates at a relatively low speed, with jets of a washing liquid and wherein subsequent drying is carried out in the same chamber by increasing the rotation speed of the wafer and supplying isopropyl-alcohol (IPA) mist onto the wafer from the top of the chamber. After the IPA forms a solution with the residue of water on the wafer, the drying process is accelerated by supplying gaseous nitrogen through nozzles arranged on both sides of the wafer he coaxially with the wafer center. As a result, the IPA-water solution quickly evaporates without leaving traces of water drops on the dried surface.
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