Imprint lithography method and apparatus

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United States of America Patent

PATENT NO 9278466
APP PUB NO 20150136324A1
SERIAL NO

14605637

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Abstract

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In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VDE RUN 6501 VELDHOVEN NL-5504 DR

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Banine, Vadim Yevgenyevich Helmond, NL 222 2976
Dijksman, Johan Frederik Weert, NL 85 1289
Koole, Roelof Utrecht, NL 42 730
Kruijt-Stegeman, Yvonne Wendela Eindhoven, NL 60 572
Lammers, Jeroen Herman Eindhoven, NL 29 216
Wuister, Sander Frederik Eindhoven, NL 98 1240

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