Methods and apparatus for material processing using dual source cyclonic plasma reactor
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United States of America Patent
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Mar 15, 2016
Grant Date -
Oct 1, 2015
app pub date -
Mar 31, 2014
filing date -
Mar 31, 2014
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Abstract
Methods and apparatus provide for: feeding glass batch material into a plasma containment vessel; directing one or more sources of plasma gas into an inner volume of the plasma containment vessel in such a way that the plasma gas swirls in a cyclonic fashion within the plasma containment vessel; and applying first and second electromagnetic fields to the plasma gas to facilitate production of a plasma plume within the inner volume of the plasma containment vessel, where the plasma plume is of a generally cylindrical configuration, and is of sufficient thermal energy to cause the glass batch material to thermally react.
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