Process for fabricating a monolayer or multilayer metal structure in LIGA technology, and structure obtained
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United States of America Patent
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Mar 15, 2016
Grant Date -
Mar 17, 2011
app pub date -
Nov 23, 2010
filing date -
Mar 15, 2006
priority date (Note) -
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Abstract
The invention relates to a process for fabricating a monolayer or multilayer metal structure in LIGA technology, in which a photoresist layer is deposited on a flat metal substrate, a photoresist mold is created by irradiation or electron or ion bombardment, a metal or alloy is electroplated in this mold, the electroformed metal structure is detached from the substrate and the photoresist is separated from this metal structure, wherein the metal substrate is used as an agent involved in the forming of at least one surface of the metal structure other than that formed by the plane surface of the substrate.
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