Scanner based optical proximity correction system and method of use
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United States of America Patent
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Mar 15, 2016
Grant Date -
Jul 25, 2013
app pub date -
Dec 20, 2012
filing date -
Jan 18, 2007
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Abstract
A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns is compared against the simulated, corrected reticle design. A determination is made as to whether δ1<ε1, wherein δ1 represents model vs. exposure difference and ε1 represents predetermined criteria. The technique further includes completing the model when δ1<ε1.
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