Pattern-forming method, and radiation-sensitive composition

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United States of America Patent

PATENT NO 9298090
APP PUB NO 20150177616A1
SERIAL NO

14640882

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Abstract

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A pattern-forming method includes providing a resist film on a substrate using a radiation-sensitive composition. The resist film is exposed. The exposed resist film is developed using a developer solution. The developer solution includes no less than 80% by mass of an organic solvent. The radiation-sensitive composition includes at least two components including a first polymer and a radiation-sensitive acid generator. The first polymer includes a structural unit having an acid-labile group. One or more components of the radiation-sensitive composition have a group represented by a formula (1). A− represents —N−—SO2—RD, —COO−, —O− or —SO3−. —SO3− does not directly bond to a carbon atom having a fluorine atom. RD represents a linear or branched monovalent hydrocarbon group, or the like. X+ represents an onium cation.

description='In-line Formulae' end='lead'-A− X+  (1)description='In-line Formulae' end='tail'

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Patent Owner(s)

  • JSR CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Furukawa, Taiichi Tokyo, JP 29 100
Hori, Masafumi Tokyo, JP 27 116
Ito, Koji Tokyo, JP 354 3746
Sakakibara, Hirokazu Tokyo, JP 40 195

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