Texturing of monocrystalline semiconductor substrates to reduce incident light reflectance

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United States of America Patent

PATENT NO 9303207
APP PUB NO 20140284529A1
SERIAL NO

14295262

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Abstract

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Monocrystalline semiconductor substrates are textured with alkaline solutions to form pyramid structures on their surfaces to reduce incident light reflectance and improve light absorption of the wafers. The alkaline baths include hydantoin compounds and derivatives thereof in combination with alkoxylated glycols to inhibit the formation of flat areas between pyramid structures to improve the light absorption.

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Patent Owner(s)

  • SUN CHEMICAL CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Barr, Robert K Shrewsbury, US 73 392
O'Connor, Corey Oakham, US 22 101
Toben, Michael P Smithtown, US 33 316

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