Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same

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United States of America Patent

PATENT NO 9316912
APP PUB NO 20150205205A1
SERIAL NO

14449415

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Abstract

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A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent.

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Patent Owner(s)

  • FUJIFILM CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Inabe, Haruki Shizuoka, JP 42 941
Kobayashi, Hiromi Shizuoka, JP 70 632

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