Semiconductor device and method for manufacturing semiconductor device

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United States of America Patent

PATENT NO 9318602
APP PUB NO 20140084364A1
SERIAL NO

13926307

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Abstract

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A semiconductor device according to one embodiment includes a semiconductor substrate, a back-gate layer formed above the semiconductor substrate, and a stacked body formed above the back-gate layer and comprising a plurality of insulating layers alternately formed between a plurality of electrode layers. The lowermost electrode layer of the plurality of electrode layers contains metal, and remaining electrode layers of the plurality of electrode layers other than the lowermost electrode layer do not contain the metal. Furthermore, the semiconductor device includes a pair of columnar semiconductor layers penetrating the stacked body and a semiconductor layer connecting lower portions of the pair of columnar semiconductor layers, the semiconductor layer embedded in the surface of the back-gate layer.

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Patent Owner(s)

  • TOSHIBA MEMORY CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Taniguchi, Shuichi Kanagawa, JP 15 164

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