Process for the electrochemical deposition of a semiconductor material
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United States of America Patent
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Apr 26, 2016
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Nov 19, 2015
app pub date -
Jul 24, 2013
filing date -
Jul 27, 2012
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Abstract
A process for the electrochemical deposition of a semiconductor material, which process comprises: (i) providing a non-aqueous solvent; (ii) providing at least one precursor salt which forms a source of the constituent elements within the semiconductor material to be deposited; and (iii) electrodepositing the semiconductor material onto an electrode substrate using the precursor salt in the non-aqueous solvent, characterized in that: (iv) the semiconductor material is a p-block or a post-transition metal semiconductor material containing at least one p-block element or post-transition metal; and (v) the non-aqueous solvent is a halocarbon non-aqueous solvent.
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