Method and system for cleaning a vacuum chamber

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United States of America Patent

PATENT NO 9327324
APP PUB NO 20140238438A1
SERIAL NO

13777044

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Abstract

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A system and method are described, for use in cleaning of a vacuum chamber. The method comprising connecting a vacuum chamber to a plasma generating unit via a plasma connection port and connecting the vacuum chamber to a high vacuum pumping unit via a pumping port. A flow conductance through the plasma connection port to the vacuum chamber is controlled to limit passage of charged particles and cleaning substances produced in the plasma generating unit, to thereby maintain a working pressure inside the vacuum chamber while cleaning the vacuum chamber by said cleaning substances.

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Patent Owner(s)

  • APPLIED MATERIALS ISRAEL, LTD.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Eitan, Guy Kidron, IL 4 27
Nir, Irit Ruach Rehovot, IL 1 4
Segev, Lior Rehovot, IL 3 32

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