Material quality, suspended material structures on lattice-mismatched substrates

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United States of America Patent

PATENT NO 9330907
SERIAL NO

14512158

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Abstract

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Suspended structures are provided using selective etch technology. Such structures can be protected on all sides when the selective undercut etch is performed, thereby providing excellent control of feature geometry combined with superior material quality.

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Patent Owner(s)

Patent OwnerAddress
THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITYOFFICE OF THE GENERAL COUNSEL BLDG 170 3RD FL MAIN QUAD PO BOX 20386 STANFORD CA 94305-2038

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Robert Mountain View, US 127 1976
Gupta, Suyog White Plains, US 14 67
Harris,, Jr James S Stanford, US 19 118

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