Systems and methods for drying a rotating substrate
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United States of America Patent
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May 10, 2016
Grant Date -
Sep 25, 2014
app pub date -
Jun 3, 2014
filing date -
Jan 18, 2006
priority date (Note) -
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status (Latency Note)
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Abstract
A system for drying a surface of a substrate is provided. The system for drying a surface of a substrate comprising: a rotary support; a first dispenser fluidly coupled to a source of liquid, the first dispenser positioned above the surface of the substrate so as to be capable of applying a film of the liquid to the surface of the substrate; a second dispenser fluidly coupled to a source of drying fluid with a supply line, the second dispenser positioned above the surface of the substrate so as to be capable of applying the drying fluid to the surface of the substrate; and a proportional valve operably coupled to the supply line between the second dispenser and the source of drying fluid, the proportional valve capable of being incrementally adjusted from a closed position to an open position.
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