Sputtering device

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United States of America Patent

PATENT NO 9340868
APP PUB NO 20140076714A1
SERIAL NO

13760758

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Abstract

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A sputtering device includes: a sputtering target; a substrate supporter facing the sputtering target and upon which a substrate is disposed; an anode mask between the sputtering target and the substrate which is on the substrate supporter; and a gas distribution member between the anode mask and the sputtering target, and including a plurality of gas distribution tubes separated from each other. Each gas distribution tube includes a plurality of discharge holes defined therein and through which gas is discharged to a vacuum chamber configured to receive the sputtering device.

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Patent Owner(s)

  • SAMSUNG DISPLAY CO., LTD.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hwang, Jin Ho Osan-si, KR 122 132
Jeong, Chang-Oh Suwon-si, KR 132 5469
Kim, Do-Hyun Seongnam-si, KR 108 5365
Kim, Woo Song Hwaseong-si, KR 2 6
Shin, Sang Won Yongin-si, KR 32 75

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