Viewport protector for an extreme ultraviolet light source

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United States of America Patent

PATENT NO 9341752
APP PUB NO 20140126043A1
SERIAL NO

13671378

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Abstract

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A protector for a viewport of a vacuum chamber includes a substrate material that absorbs radiation having a wavelength of an amplified light beam and radiation having a wavelength included in an emission spectra of a target material that produces EUV light when ionized by the amplified light beam. The substrate material transmits one or more of visible or near-infrared light. The protector also includes a layer formed on the substrate material, and the layer reflects radiation having the wavelength of the amplified light beam.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VVELDHOVEN

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Senekerimyan, Vahan San Diego, US 10 95

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