Charged particle beam pattern writing method and charged particle beam writing apparatus that corrects beam rotation utilizing a correlation table
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United States of America Patent
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May 17, 2016
Grant Date -
Mar 6, 2014
app pub date -
Jul 25, 2013
filing date -
Aug 30, 2012
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Abstract
A charged particle beam pattern writing method according to an embodiment, includes measuring a position displacement amount of a stage above which a target object is placed, in a rotation direction; and writing a pattern of a beam image on the target object above the stage while the beam image is rotated, by using a plurality of electrostatic lenses at least one of which is arranged in a magnetic field of each of the plurality of electromagnetic lenses whose magnetic fields are in opposite directions, to avoid a focus displacement of a charged particle beam passing through the plurality of electromagnetic lenses and to correct the position displacement amount measured, in the rotation direction of the stage.
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